http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201233784-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-32 |
| filingDate | 2011-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43b2dcd490789b9cfff11b4815abd577 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5ac51002f2ffe29bd3271a5722e76cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c45f3a4f18c66b8bd65ccb7152d0717 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ed2272941ce130e5d140ddf5a0da35a |
| publicationDate | 2012-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201233784-A |
| titleOfInvention | Texture etching solution composition and texture etching method of crystalline silicon wafers |
| abstract | Disclosed are a texture etching solution composition for a crystalline silicon wafer and a texture etching method and, more particularly, a composition which includes an alkaline compound; a cyclic compound; at least one surfactant selected from a group consisting of a polyoxyethylene (POE) compound, a polyoxypropylene (POP) compound and copolymers thereof; and water. According to the texture etching solution composition for a crystalline silicon wafer and the texture etching method of the present invention, it is possible to minimize a deviation in texture quality of the surface of a crystalline silicon wafer to improve uniformity of a texture structure, thus maximizing an absorbed amount of solar light while decreasing light reflectivity and finally enhancing luminous efficacy. Moreover, an amount used may be considerably decreased to increase the number of sheets to be treated and, since an alternative etching solution component is not needed to be introduced during texturing, productivity may be improved while attaining economical advantage in terms of costs. |
| priorityDate | 2010-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 220.