| abstract |
Provided is a ferromagnetic material sputtering target that: is a sputtering target comprising a metal with a composition including Cr at 20 mol% max., Pt at 5 mol% min., and Co as the remainder; and is characterized by the target having a metal matrix (A), and, in the metal matrix (A), a Co-Pt alloy phase (B) containing 40-76 mol% Pt and Co, a metal with Co as the main component thereof, or an alloy phase (C), that are different to the alloy phase (B). A ferromagnetic material sputtering target capable of improving leakage magnetic flux and stable discharge with a magnetron sputtering device is obtained. |