http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201229265-A

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filingDate 2011-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_731eb6d0fce0b7ca6323a40d93a4949f
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publicationDate 2012-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201229265-A
titleOfInvention Ferromagnetic material sputtering target
abstract Provided is a ferromagnetic material sputtering target that: is a sputtering target comprising a metal with a composition including Cr at 20 mol% max., Ru at 0.5-30 mol%, and Co as the remainder; and is characterized by the target structure having a metal matrix (A) and a Co-Ru alloy phase (B) in the metal matrix (A) that contains 35 mol% or more Ru. A ferromagnetic material sputtering target capable of improving leakage magnetic flux and stable discharge with a magnetron sputtering device is obtained.
priorityDate 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.