http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201227176-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2011-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c29c6f143f3656c8d7985d809448bc1a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6dedb2bfd6b34c51908678e6ad554b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d59fc16c05232a51ae619b9c701f003 |
| publicationDate | 2012-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201227176-A |
| titleOfInvention | Resist underlayer film forming composition containing silicone having protected aliphatic alcohol-containing organic group |
| abstract | To provide a composition for forming an underlayer film for a lithographic resist, which can be used for forming an underlayer film for a solvent-developable resist that can be used as a hard mask. A composition for forming an underlayer film for a solvent-developable resist, which comprises a hydrolysable organosilane which has an organic group containing a protected aliphatic alcohol group and capable of binding to a silicon atom, a hydrolysis product or hydrolysis condensation product of the hydrolysable organosilane or a combination thereof and a solvent, wherein preferably the hydrolysable organosilane, a hydrolysis product or hydrolysis condensation product of the hydrolysable organosilane or a combination thereof is contained as a silane compound, and wherein silicon atoms are contained in the silane compound which has an organic group containing a protected aliphatic alcohol group and capable of binding to a silicon atom in an amount of 0.1 to 40 mol% relative to the total amount of the silicon atoms contained in the composition; and a method for forming an underlayer film for a resist, which is produced by applying the composition for forming an underlayer film onto a semiconductor substrate and burning the composition-applied semiconductor substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I503628-B |
| priorityDate | 2010-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 702.