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filingDate 2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201227166-A
titleOfInvention Method of manufacturing a multi-tone photomask and pattern transfer method
abstract To reduce the number of times of writing and development by utilizing film thickness reduction of a resist pattern and to improve the in-plane uniformity of the thickness reduction rate of the resist pattern between dense and coarse regions. A method includes a step of forming a first resist pattern which covers a light shielding portion forming region and a light semi-transmitting portion forming region and in which the thickness of a resist film in the light semi-transmitting portion forming region is smaller than that in the light-shielding portion forming region, and a step of reducing the thickness of the first resist pattern by supplying active oxygen to the first resist pattern. A part of active oxygen supplied to the first resist pattern is consumed by an exposed light semi-transmitting film.
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