http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201226489-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4c608a8531ea588aab7e23318e09a77 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2010-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01692dd965dd9c8a2daa1ced3724faec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dc1dcd0bcfafc27338ee5ac60c958d2 |
| publicationDate | 2012-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201226489-A |
| titleOfInvention | Chemical mechanical polishing fluid |
| abstract | The present invention discloses a chemical mechanical polishing fluid, which includes water, a grinding agent, a chemical compound capable of etching tungsten, and at least a tungsten-etching inhibitor, wherein the tungsten-etching inhibitor is selected from a double bond-containing amide. The polishing fluid contains extremely high tungsten polishing rate and simultaneously contains very low tungsten static etch rate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113004801-A |
| priorityDate | 2010-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 81.