| abstract |
This invention relates to a photo-curing polysiloxane composition comprising polysiloxane (A), o-naphthoquinonediazidesulfonic acid ester (B) and solvent (C), wherein the polysiloxane (A) has a weight percentage of from 25 wt% to 60 wt% with molecular weight of from 10, 000 to 80, 000, which is calculated by intergral molecular weight distribution curve obtained by plotting the cumulative weight percentage versus molecular weight falling within a range between 400 and 100, 000 measured by gel permeation chromatography. And oligomers of the polysiloxane (A) has a weight percentage of from 0 wt% to 10 wt% with molecular weight of under 800, based on the photo-curing polysiloxane composition. This invention also provides a protecting film having a hard-collapsed profile after post-baked, and an element containing the protecting film. |