| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D327-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 |
| filingDate |
2011-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321d114d76108c3dfde0d4c0b5877dde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 |
| publicationDate |
2012-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201222145-A |
| titleOfInvention |
Resist composition, method of forming resist pattern, novel compound, and acid generator |
| abstract |
A resist composition comprising a substrate component (A) which changes solubility thereof to an alkaline developer liquid by an acid, and acid generator component (B) which generate acid by an exposure, wherein the acid generator component (B) comprises an acid generator component (B1) composed of the compound represented by the following general formula (b1-1), wherein Z<SP>+</SP> represents an organic cation. |
| priorityDate |
2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |