http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201219986-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c79650a123cc1b44c81af63049aab47 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08af8e1a8afe96faf8248c1803248121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0207ac1bc5b6dff996919c7180c91bf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 |
| publicationDate | 2012-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201219986-A |
| titleOfInvention | Resist underlayer film forming composition and method for forming resist pattern by using the composition |
| abstract | Provided is a composition for forming an underlayer film that has strong adhesion with a resist film, that is capable of forming a good resist pattern even when the resist underlayer film is a thin film for obtaining a thin resist film, and that is capable of accomplishing expansion of the focus depth margin, and also provided is a method for forming a resist pattern using the composition. The composition for forming a lithographic resist underlayer film includes: a polymer which includes structural units represented by formula (1) and structural units having crosslinking sites; a crosslinking agent; a compound which promotes crosslinking; and an organic solvent. (1) (In the formula, R1 is a hydrogen atom or methyl group; A is an alkylene group or phenylene group; Y is a nitrogen atom or phosphorus atom; R2 through R4 are each independently a hydrogen atom, alkyl group, or phenyl group; X- is an alkylsulfonic acid anion, alkylsulfate anion, chloride anion, bromide anion, fluoralkylsulfonic acid anion, boron tetrafluoride anion, phosphorus hexafluoride anion, or alkylcarboxylic acid anion.) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110879508-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110879508-B |
| priorityDate | 2010-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.