| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb2c4837169cb5346fc2ab4884a4187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63da6c891154d2cc6f0be022bc3bb2ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9473e6941c583ff6ee73ad721e18287
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9163d5763457518986267c7f5364aae |
| publicationDate |
2012-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201219972-A |
| titleOfInvention |
Resist pattern formation method and radiation-sensitive resin composition |
| abstract |
The present invention provides a resist pattern formation method comprising: (1) a resist film formation step of applying a radiation-sensitive resin composition to a substrate; (2) an exposure step; and (3) a step of developing using a developing solution containing 80 mass% or more of an organic solvent; wherein the radiation-sensitive resin composition includes: [A] a base polymer having an acid-dissociable group; [B] a radiation-sensitive acid generator containing a cation and an anion, the anion having an alicyclic group and the ratio (F/C) of fluorine atoms and carbon atoms of the anion being 0.1 to 0.5; and [C] a fluorine-containing polymer in which the content ratio of fluorine atoms is higher than that of the polymer of [A]. |
| priorityDate |
2010-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |