| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition are provided, which can satisfy high photosensitivity, high resolution, good pattern shape, good line edge roughness at a high standard as well as have good outgassing property under exposure. The actinic ray-sensitive or radiation-sensitive resin composition of the invention includes resin (P), and the described resin (P) includes a repeating unit (A) which is decomposed to generate acid upon irradiation with an actinic ray or radiation ray; and a repeating unit (C) having primary or secondary hydroxy group. |