| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2011-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c2bdd6dc202dc9e38663ed7bae4c128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6990198dd6b31314b784d3cde874cbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3c9de8e17deb76acd01d2e187f11ef2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aed3da245984185c752ee62935ace589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ff651eff6fc8ba8d837a5260f894108 |
| publicationDate |
2012-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201214536-A |
| titleOfInvention |
Chemical solution for forming protective film and wafer surface washing method |
| abstract |
The invention discloses a chemical solution for forming a water-repellent protective film on at least the concave surface of the metallic wafer. The chemical solution comprises water and a surfactant with an HLB value of 0.001-10 according to Griffin's method and is inclusive of hydrophobic sections of hydrocarbon group containing 6-18 carbon number. The concentration of the surfactant in the chemical solution is relative to the 100 mass% total volume of the chemical solution, which is at least 0.00001 mass% but no greater than the saturation concentration. The chemical solution improves pattern collapse on the metallic wafer during the washing processes. |
| priorityDate |
2010-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |