| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 |
| filingDate |
2011-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e146ee005efd67bd9b2f4f3225afcd36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca9ca98b9e27b142c456023e8d2bbfc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59224293f0057bb4dbfd15a239762891
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47444ed2c5a58d0565bf04697bba0171 |
| publicationDate |
2012-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201214039-A |
| titleOfInvention |
Radiation-sensitive resin composition, polymer, and method for forming resist pattern |
| abstract |
The present invention provides a radiation-sensitive resin composition containing: [A] a polymer component having a structural unit (I) represented by formula (1) and a structural unit (II) represented by formula (2) in the same or different polymers; [B] a radiation-sensitive acid generator; and [C] a nitrogen-containing compound having a cyclic structure. In formula (1), R1 represents a hydrogen atom or a methyl group; Z represents a group that forms, together with R2, a divalent monocyclic alicyclic hydrocarbon group; R2 is a carbon atom; and R3 is a methyl group or ethyl group. In formula (2), R4 is a hydrogen atom or a methyl group; X is a group that forms, together with R5, a C10 or greater divalent bridged alicyclic hydrocarbon group; R5 is a carbon atom; and R6 is a C3 or C4 branched alkyl group. |
| priorityDate |
2010-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |