http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201211236-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3765 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-06 |
| filingDate | 2011-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfec26b46da1036ea3f18a5d7c4298c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a6a423635488c986c05b8a9dd511d36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06a3a67c99a2e1549301923f32bc5543 |
| publicationDate | 2012-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201211236-A |
| titleOfInvention | Cleaning solution for substrate for semiconductor devices and method of cleaning substrate for semiconductor devices |
| abstract | An object of the present invention is to provide a cleaning solution for a substrate for semiconductor devices capable of simultaneously removing contamination due to adhesion of a fine particle, contamination by an organic substance, and contamination by a metal without corroding any surface of the substrate and capable of highly cleaning the surface of the substrate in a short time whcrein water rinse nature is also good. The present invention relates to a cleaning solution for a substrate for semiconductor devices including the following components (A) to (D) and a method of cleaning a substrate for semiconductor devices using the solution. (A) at least one of a polycarboxylic acid and a hydroxycarboxylic acid, (B) a sulfonic acid type anionic surface active agent, (C) a carboxylic acid type anionic surface active agent, and (D) water. |
| priorityDate | 2010-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 98.