| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-32182
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P90-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-41875 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2011-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f3192df9cd268f01de20f483c209146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5943d939a758485d9211e9e0a0baa060
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aac4092eafd584bce56af6c1f9cd6e15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_522a5c4d6259f94072f3d21c83cfdbeb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11380c1170e92a310b1826e6d38fbd1c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51c2ddcd62662ca4e644c6a25c7dab0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_846d2d7260b6c1a959ab7cc0f4ad0a03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e9b1edcfb6cc5334c55aca6dd0368bb |
| publicationDate |
2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201209948-A |
| titleOfInvention |
Data perturbation for wafer inspection or metrology setup |
| abstract |
Various embodiments for determining parameters for wafer inspection and/or metrology are provided. |
| priorityDate |
2010-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |