http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201207150-A

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filingDate 2010-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f24a396be175571a69090e8ac23e3e25
publicationDate 2012-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201207150-A
titleOfInvention Chemical vapor deposition device
abstract A chemical vapor deposition device includes a chamber body, an air importing apparatus, an air exhaust apparatus, a heating apparatus, and an actuating apparatus. The chamber body has a first side, a second side opposite to the first side, and a deposition area located between the first side and the second side for accommodating a roller. The air importing apparatus is located in the chamber body and on the top of the first side. The air importing apparatus has a nozzle facing the deposition area for injecting airs to the deposition area. The air exhaust apparatus is located in lower position of the second side. The air exhaust apparatus is used for exhausting the airs in the chamber body, then forming an air current from the first side to the second side. The heating apparatus is positioned below the deposition area. The actuating apparatus is engaged with the roller for driving the roller rotate around its shaft.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107012444-A
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priorityDate 2010-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 31.