| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d5d12da3fcbf6735c15f889d080d94f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2110-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2101-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-797
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-2835 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G101-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-02 |
| filingDate |
2011-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d5c6a0217e88d9bb4ced3d01479bb1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4155cc17f7ecf4598a17af040ccd67b0 |
| publicationDate |
2012-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201206642-A |
| titleOfInvention |
Polishing pad and method for manufacturing the same, and method for manufacturing semiconductor device |
| abstract |
Disclosed is a polishing pad that can reduce tiny undulations on the surface of an object to be polished. Also disclosed are a method for manufacturing said polishing pad and a method for manufacturing a semiconductor device. The disclosed polishing pad has a polishing layer comprising a thermoset polyurethane foam that contains, as basic ingredients, an isocyanate component and active-hydrogen-containing compounds. Said active-hydrogen-containing compounds include a polyol compound with at least two functional groups and a mono-ol compound with one functional group. |
| priorityDate |
2010-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |