http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201204817-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
filingDate | 2011-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e013a9eed35833d1cd1accc769d86fc8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc51c09347a141a175979c328057fbfa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0ec5072a8a8361337d469d41367b408 |
publicationDate | 2012-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201204817-A |
titleOfInvention | Polishing agent for polishing copper and polishing method using the same |
abstract | A polishing agent for polishing copper includes: a first organic acid component selected from at least one of an organic acid containing hydroxyl group, a salt of the organic acid and an acid anhydride of the organic acid, an inorganic acid component selected from at least one of an inorganic acid of divalence or more and a salt of the inorganic acid, an amino acid, a protective film forming agent, an abrasive grain, an oxidant and water. Base on a total amount of the polishing agent for polishing copper, the conversion content of inorganic acid in the inorganic acid component is 0.15 mass% or more, the amino acid content is 0.30 mass% or more, the protective film forming agent content is 0.10 mass% or more, a ratio of the conversion content of organic acid in the first organic acid component to the protective film forming agent content is 1.5 or more. |
priorityDate | 2010-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 176.