| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e5006918dbd7d5d203c06e328ff642a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18443fb56f0942e465bb1a21b5af20fe |
| publicationDate |
2012-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201202842-A |
| titleOfInvention |
Radiation-sensitive resin composition and pattern forming method |
| abstract |
Disclosed is a radiation-sensitive resin composition which is suitable for a liquid immersion exposure process for the formation of a resist pattern, and is also suitable for development by an organic solvent. Specifically disclosed is a radiation-sensitive resin composition which is used in a resist pattern forming method wherein development is carried out by an organic solvent (X). The radiation-sensitive resin composition is characterized by containing (A) a polymer, (B) a radiation-sensitive acid generator, and (C) a solvent, and is also characterized in that the polymer (A) contains at least one repeating unit (a2) that is selected from formula (1-1) to formula (1-7). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105980347-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104508563-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I650310-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9994513-B2 |
| priorityDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |