http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201145399-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1248 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66765 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
| filingDate | 2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed7628460ee464cc5734ba20ffac94ad |
| publicationDate | 2011-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201145399-A |
| titleOfInvention | Method for producing semiconductor element substrate |
| abstract | Disclosed is a method for producing a semiconductor element substrate, which involves: a step for subjecting the semiconductor element surface or the semiconductor layer element surface contained in the aforementioned semiconductor element to plasma processing; and a step for forming a passivation film formed from an organic material on the semiconductor element surface or the semiconductor element layer surface which were subjected to plasma processing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I506833-B |
| priorityDate | 2010-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 387.