http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201142496-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate | 2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb2c4837169cb5346fc2ab4884a4187 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f73a270ddcc3792b1bff4740b69cbe1f |
| publicationDate | 2011-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201142496-A |
| titleOfInvention | Radiation-sensitive resin composition and polymer |
| abstract | Disclosed are: a radiation-sensitive resin composition which can fulfill various requirements such as the reduction in CDU (CD uniformity) and MEEF (mask error enhanced factor) during the formation of a hole pattern; and a polymer for use in the composition. Specifically disclosed are: a polymer which has a repeating unit having a specific structure and containing an adamantane structure and a repeating unit having a specific structure and containing a cycloalkane structure; and a radiation-sensitive resin composition containing the polymer. |
| priorityDate | 2010-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.