| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
| filingDate |
2010-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe06fbad1fd7508a680752e9e79d99c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc2e29643266101a36191471e25d7162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89abab811069c64e02454132b3ab9bc4 |
| publicationDate |
2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201140231-A |
| titleOfInvention |
Radiation-sensitive composition |
| abstract |
Disclosed is a radiation-sensitive composition which, when used in a lithography process of a substrate having a multilevel (uneven) surface, can exhibit a high developing/dissolution rate in a part where the light exposure amount is reduced, such as a lower part of the multilevel surface and an intersection between a resist pattern and the multilevel surface and therefore enables the formation of a resist pattern having an excellent scum margin and a good shape. The radiation-sensitive composition comprises: (A) a polymer of (A1) a polymer that contains a repeating unit represented by formula (1) and (A2) a polymer that contains a repeating unit represented by formula (2) and does not contain a repeating unit represented by formula (1); and (B) a radiation-sensitive acid-generating agent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105404096-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105301905-A |
| priorityDate |
2009-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |