Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
filingDate |
2011-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13d32c4da28dcacbf46aab593887ffb6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2904ec7d07a77500825a81ff27c21e2e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_268d8bf12fbb1399e594b33aeb970d9b |
publicationDate |
2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201139623-A |
titleOfInvention |
Copper oxide etchant and etching method using same |
abstract |
Disclosed is a copper oxide etchant, which, when using a copper oxide as a thermal reaction resist material and exposed with a laser, is capable of selectively etching exposed/unexposed areas; also disclosed is an etching method using the same. The disclosed copper oxide etchant selectively etches copper oxides of different oxidation numbers in a copper oxide-containing layer having a copper oxide as the main component, and is characterized by containing at least a chelating agent or a salt thereof. |
priorityDate |
2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |