http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201138992-A

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filingDate 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba5e052a16207277f6bee559b5e26b5f
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publicationDate 2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201138992-A
titleOfInvention Nanoimprinting method, method for producing a droplet arrangement pattern, and method for fabricating substrates
abstract To suppress fluctuations in thickness of a residual layer and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets (D) are coated onto a substrate (3) such that the spaces (Wa) between the droplets (D) along an A direction which is substantially parallel to the direction of the lines of a linear patter of protrusions and recesses (P1) are longer than the spaces between the droplets (D) in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets (D) of a resist material using the ink jet method.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107942617-A
priorityDate 2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 21.