http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201132749-A

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publicationDate 2011-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201132749-A
titleOfInvention Slurry, abrasive solution set, abrasive solution and substrate polishing method using the same
abstract A slurry containing abrasive grains and water is provided. The abrasive grains include a 4 valent cerium hydroxide, and the light transmittance of a water dispersion is 50%/cm or more relative to the light with 500 nm wavelength, wherein the content of the abrasive grains is adjusted to 1.0 wt% in the water dispersion. An abrasive solution containing abrasive grains, a additive agent and water is provided. The abrasive grains include a 4 valent cerium hydroxide, and the light transmittance of the water dispersion is 50%/cm or more relative to the light with 500 nm wavelength, wherein the content of the abrasive grains is adjusted to 1.0 wt% in the water dispersion.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9988573-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10549399-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9881802-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I576417-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9932497-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I576418-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10557059-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I576419-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10825687-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I768008-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10703947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10196542-B2
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