| abstract |
This invention relates to an aqueous cleaning composition for removing contaminants from a channel of a thin film transistor in the course of manufacturing a flat panel display and to a cleaning method using the same. The aqueous cleaning composition is highly capable of removing organic contaminants, metal-resist deposits, metal oxides and metal complexes formed on the channel of the thin film transistor, and is effective in preventing corrosion of metal wiring, in particular, copper or copper alloy wiring, and an insulating layer, formed on a substrate. The aqueous cleaning composition includes a large amount of deionized water and thus is easy to handle and is environmentally friendly. |