| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc6220b93fae4be14ada49e4ecc1860b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2010-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abd0f284b31b9f60f98fbb60bac454e1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dabfbbf0a5be6d0ad4c1eccf61957ec9 |
| publicationDate |
2011-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201126286-A |
| titleOfInvention |
Resist layer removing composition and method for removing a resist layer by using such composition |
| abstract |
This invention provides a resist layer removing composition for use in removing a resist layer easily from a semiconductor board in the process of photolithography in the field of semiconductor fabrication, and a method for removing a resist layer by using such composition in a simple manner. The composition of this invention contains: [I] a carbon radical generating agent, [II] an acid, [III] a reducing agent, and [IV] an organic solvent; the composition has a pH value of less than 7. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I752903-B |
| priorityDate |
2009-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |