http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201125997-A

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publicationDate 2011-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201125997-A
titleOfInvention Ferromagnetic-material sputtering target of nonmagnetic-material particle dispersion type
abstract A ferromagnetic-material sputtering target of a nonmagnetic-material particle dispersion type which comprises a mixture of particles of a nonmagnetic material and an alloy comprising 5-20 mol% Cr, 5-30 mol% Pt, and Co as the remainder, characterized by having a structure comprising a phase (A) composed of the alloy and the nonmagnetic-material particles evenly microdispersed therein and a spherical alloy phase (B) dispersed in the phase (A), the proportion of the phase (B) being 4-40 vol.% of the target. The ferromagnetic-material sputtering target of a nonmagnetic-material particle dispersion type improves leakage flux to enable a stable electric discharge to be obtained with a magnetron sputtering device. The target has a high density and generates few particles during sputtering.
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