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publicationDate 2011-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201119046-A
titleOfInvention Solid-state imaging device, fabrication method thereof, imaging apparatus, and fabrication method of anti-reflection structure
abstract A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate.
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