| abstract |
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R1, R2 and R3 each independently represent a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond or a C1-C2 alkylene group, R4 and R5 each independently represent a hydrogen atom or a C1-C2 alkyl group, R6 and R7 each independently represent a hydrogen atom etc. |