| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2010-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_849a97649244b84fd4cd0e94270460db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e34c21a8861c45dbe7c96760158af6a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0f7279171ad82bd5bd536eec5c5f9ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca9ec45d973f08c63f3563cd36b0da7b |
| publicationDate |
2011-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201115263-A |
| titleOfInvention |
Mask blank and transfer mask |
| abstract |
Provided is a mask blank to which EB defect correction can be suitably applied and which allows a light-blocking film to be made thinner. The provided mask blank (10) has a light-blocking film (2) on top of a light-transmitting substrate (1) and is used to create a transfer mask to which ArF exposure light is applied. The light-blocking film (2) consists primarily of a material that contains a transition metal, silicon, and oxygen and/or nitrogen. With this light-blocking film, an etching rate when a fluorine-containing substance is not irradiated by charged particles is at least slow enough to ensure etch selectivity with respect to an etching rate when a fluorine-containing substance is irradiated by charged particles. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I548933-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I594070-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I610123-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I562197-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9625805-B2 |
| priorityDate |
2009-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |