| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7ef01e33058cf740cf2197991be97af1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2483-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-0427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-16 |
| filingDate |
2010-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f45583ed746aa4b58a7267dfd4d2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5eb9aef8c70eee433885966016ba7bed |
| publicationDate |
2011-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201113152-A |
| titleOfInvention |
Laminate and manufacturing method thereof |
| abstract |
This invention provides a laminate and the manufacturing method thereof. The laminate includes a substrate and a silicon-containing film formed on the substrate. The silicon-containing film includes a high concentration nitrogen-containing region constituted by silicon atoms and nitrogen atoms, or by silicon atoms, nitrogen atoms and oxygen atoms. The high concentration nitrogen-containing region is formed by irradiating energy line onto a polysilazane film formed on the substrate in a substantially oxygen-free or steam-free atmosphere so as to modify at least part of the film. |
| priorityDate |
2009-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |