| abstract |
To provide a positive photosensitive composition used for forming a patterned film excellent in high heat resistance, high transparency, crack resistance and adhesiveness to a substrate, and obtained by developing with aqueous alkaline solution, the present invention provides a positive photosensitive composition which contains: specific tetrafunctional silsesquioxane compound (A); siloxane polymer (B) prepared by various kinds of alkoxysilane compounds having different numbers of alkoxyl group; 1,2-quinonediazide compound (C); and solvent (D). |