http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201111907-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2202-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133516 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 |
| filingDate | 2010-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b195256245da8ede518217239c267604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6307e60d0c272b42ff076047754791 |
| publicationDate | 2011-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201111907-A |
| titleOfInvention | Colored photosensitive composition, color filter, and liquid crystal display device |
| abstract | Disclosed is a colored photosensitive resin composition, which exhibits good patterning properties during development and enables the formation of a fine pattern. Specifically disclosed is a colored photosensitive resin composition, which contains a coloring agent including a black coloring material, an alkali-soluble resin, a polymerizable compound having three or more polymerizable groups, a polymerization initiator or a polymerization initiation system, and a solvent. The colored photosensitive resin composition is characterized in that when a photosensitive resin layer, which contains the colored photosensitive resin composition so as to have an optical concentration of 4.0, is formed on a transparent substrate, and then a first pattern is obtained by exposing and developing the photosensitive resin layer through a mask from a side of the photosensitive resin layer, said side being the reverse side of the transparent substrate-side, under such exposure/development conditions that the line width (W1) of the first pattern to the line width (W2) of the mask, namely W1/W2 is within the range of 0.7-1.5 and a second pattern is obtained by exposing and developing the photosensitive resin layer through a mask from the transparent substrate-side of the photosensitive resin layer under the above-described exposure/development conditions, the ratio of the film thickness (d1) of the second pattern to the film thickness (d2) of the first pattern, namely d1/d2 is not less than 0.3. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I563340-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I704052-B |
| priorityDate | 2009-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 136.