| abstract |
A radiation-sensitive resin composition which is a material for resists having excellent resolution, etc., the composition comprising (A) a compound represented by general formula (1): X+Z- (X+ is a cation represented by general formula (1-1) or (1-2), and Z- is an anion such as OH-), (B) a resin comprising repeating units represented by general formula (2) and repeating units represented by general formula (3), and (C) a radiation-sensitive acid generator. (In general formulae (1-1), (1-2), (2), and (3), R2 to R7 each is a hydrogen atom or the like; R8 is an alicyclic hydrocarbon group or the like; A is a single bond or the like; and R9 is a monovalent organic group.) |