| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C321-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C321-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2010-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fc1b958be16a1abc66d8bdf424bf85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a683ddb066212c05602154af09354b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88bcabb3e0a0101711e37439a9856f96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ee30b93325a5ff0e5b37c448f79b117 |
| publicationDate |
2010-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201040666-A |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass% based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I738773-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I552220-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9799538-B2 |
| priorityDate |
2009-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |