http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201039065-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2010-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe0bf00aaca69b71750dd5e9834ce5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af2df146e3c8c403a827b3e958b36cf8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d |
| publicationDate | 2010-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201039065-A |
| titleOfInvention | Positive resist composition, method of forming resist pattern using the same, and polymeric compound |
| abstract | A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (in the formula, R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, with the provision that a + b = 1 to 3; and each of c, d and e independently represents an integer of 0 to 3). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I498324-B |
| priorityDate | 2009-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 281.