| abstract |
To introduce a new repeating unit having an acid group, capable of forming a pattern with good rectangle characteristics, into a base resin of a resist composition that forms a pattern using a high energy ray or electronic ray of a wavelength of at most 300 nm. The fluorine containing polymer compound includes a repeating unit (a) represented by formula (2) and has a weight average molecular weight of 1,000-1,000,000. (In the formula, R1 represents a polymerizable group having a double bond; R2 represents a fluorine atom or an alkyl group containing fluorine; R3 represents a hydrogen atom, an acid labile group, a cross-linking group or another monovalent organic group; and W1 is a linking group). |