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filingDate 2010-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3224c3bdfc81965402ef4cd0048c1847
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publicationDate 2010-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201037821-A
titleOfInvention High performance flash memory devices
abstract Disclosed herein is a flash memory device comprising: a wafer; a gate oxide layer disposed upon the wafer; a floating gate disposed upon the gate oxide layer, the wafer, or a combination thereof; the floating gate comprising a flat floating gate portion and a generally rectangular floating gate portion disposed upon selected areas of the flat floating gate portion; a high K dielectric material disposed upon the floating gate; and-a control gate disposed upon the high K dielectric material; wherein the high K dielectric material forms a zigzag pattern coupling the floating gate with the control gate.
priorityDate 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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