| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d231147f38595bbe3114b758cba4a298 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02579
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0245 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2010-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5e26f8f4d77f780a5fa2f20d4449094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1fa0c8f8c8c2d5f2301758f35a7489b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_044fbc9410526b2eea0f4c847692a8f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_265d5ad16e3cfbc9b86f1972fa505db1 |
| publicationDate |
2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201036038-A |
| titleOfInvention |
Method of manufacturing semiconductor device and substrate processing apparatus |
| abstract |
The semiconductor device manufacturing method of the invention comprises a carrying-in step of carrying a substrate into a processing chamber; a first film-forming step of providing the processing chamber with gas containing silicon atoms, gas containing boron atoms, and gas containing germanium atoms to form a first film on the substrate; a second film-forming step of providing the processing chamber with gas containing silicon atoms and gas containing boron atoms to form a second film on the first film; and a moving-out step of moving the substrate out of the aforementioned processing chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I578384-B |
| priorityDate |
2009-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |