http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201035354-A

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filingDate 2009-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c633fbac8e82f01a241d2d66facd674
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74269cefd1302c083f912f9be1e99325
publicationDate 2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201035354-A
titleOfInvention Film deposition apparatus, cleaning method for the same, and computer storage medium storing program
abstract A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.
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priorityDate 2008-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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