| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4d9d138d23c7ca8bfae3daf28b4eba0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2252-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2350-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C28-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 |
| filingDate |
2010-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89ef3ce1ffd7d1a9ba92055dd33f8c30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7aad0688a9a35fc36f01f8f806691405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b974ba80219f1901900e18983187e6b4 |
| publicationDate |
2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201035348-A |
| titleOfInvention |
Process for producing multilayered gas-barrier film |
| abstract |
A process for producing a multilayered film which has satisfactory productivity, exhibits high gas-barrier properties from immediately after production, and has excellent adhesion strength between the constituent layers while retaining the excellent gas-barrier properties; and a multilayered gas-barrier film obtained by the process. The process for producing a multilayered gas-barrier film comprises (1) the step of forming an inorganic thin film by vacuum deposition on at least one surface of a base film, (2) the step of forming a thin film by plasma CVD on the inorganic thin film formed in the step (1), and (3) the step of forming an inorganic thin film by vacuum deposition on the thin film formed in the step (2), wherein the steps (1) and (3) each is conducted at a pressure of 1 x 10-7 to 1 Pa and the step (2) is conducted at a pressure of 1 x 10-3 to 1 x 10 2 Pa, these steps being consecutively conducted. |
| priorityDate |
2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |