| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2009-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af2df146e3c8c403a827b3e958b36cf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe0bf00aaca69b71750dd5e9834ce5d |
| publicationDate |
2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201035130-A |
| titleOfInvention |
Positive resist composition, method of forming resist pattern |
| abstract |
A positive resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) that generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) represented by general formula (a3-1) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group, the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol%. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I601749-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I486361-B |
| priorityDate |
2008-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |