http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201033737-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L43-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2010-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4bc7748213877725b3c29e3a46b0d9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea8a1f51e53ede95820e409e45164c04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e64ab15c78a6d59ff256bf90e586d03 |
publicationDate | 2010-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201033737-A |
titleOfInvention | Radiation-sensitive resin composition, interlayer insulating film and the preparation method thereof |
abstract | This invention provides a radiation-sensitive resin composition which can show excellent evenness of film thickness even if using silt coating method as a coating method, and an interlayer insulating film having high radiation-sensitivity, and having development margin capable of forming good pattern sharp even exceeding the most preferable developing time; and an interlayer insulating film having various performances such as high heat resistance, high solvent resistance, high transparency and low dielectric constant, and the like. A laminated isolation film formed by the said resin composition is also provided. The radiation-sensitive resin composition for forming a laminated isolation film comprises: (A) alkali soluble resin; (B) 1, 2-quinonediazide compound, and (C) the specific polymer having silicone chain. The laminated isolation film is formed by the radiation-sensitive resin composition for forming a laminated isolation film. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I550354-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9897729-B2 |
priorityDate | 2009-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 368.