| abstract |
Disclosed is a radiation-sensitive resin composition which has excellent resolution performance, a low LWR, good PEB temperature dependency and excellent pattern collapse resistance, and causes little defects (i.e., excellent defectiveness). The radiation-sensitive resin composition comprises a resin (A) and a radiation-sensitive acid generator (B), wherein the resin (A) comprises a polymer having a repeating unit (A1) represented by formula (1) and a repeating unit having an acid-dissociable group. In formula (1), R1 represents a hydrogen atom, or a methyl group; R2 represents an alkylene group having 1 to 12 carbon atoms, or an alicyclic alkylene group; and m represents an integer of 1 to 3. |