| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da147af6c5d2234835ca331337f8a8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c25576b64d3d1b547dc48350d90b1a13 |
| publicationDate |
2010-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201030462-A |
| titleOfInvention |
Resist composition, method of forming resist pattern, compound and acid generator including the compound |
| abstract |
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) includes an acid generator (B1) including a compound which includes a cation moiety having a base dissociable group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I553403-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9429841-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I505025-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I753721-B |
| priorityDate |
2008-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |