| abstract |
The present invention relates to a novel photosensitive composition comprising (a) an organic polymer, (b) a photobase generator of structure (1), and (c) optionally a photoacid generator, (+A1-O2C)-B-(CO2-A2+)x (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition. |