http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201029069-A

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
filingDate 2009-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c9662d820cf28d272d9bb751f8b0014
publicationDate 2010-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201029069-A
titleOfInvention Method of using evaporating and laser annealing to construct a semiconductor structure in display panel and thin film solar panel manufacturing process
abstract This invention provides a method of using evaporating and laser annealing to construct a semiconductor structure in display panel and thin film solar panel manufacturing process. This method completes the construction of a semiconductor structure by using a twin-electron gun evaporation to construct the corresponding N+ semiconductor layer, quantum well semiconductor, and P-semiconductor layer. Moreover, a laser annealing method is utilized to sequentially scan the aforementioned semiconductor structure with a high temperature laser beam and cause evaporation to take place, so as to make an amorphous semiconductor structure to crystallize and become multi-crystalline shape. This invention can reduce manufacturing cost and also increase production dimension and enhance product performance.
priorityDate 2009-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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