http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201027249-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-08 |
| filingDate | 2009-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ce4ee13cd605314c56283255b8fc2d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29d829ceac8a5c0896ed3ff3458a996f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6e473c12fd9375c4b7ba6c96718d1bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6e2c3b167dc36e6551223444c2a34e7 |
| publicationDate | 2010-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201027249-A |
| titleOfInvention | Radiation-sensitive resin composition, spacer and protective film of liquid crystal element, and method for manufacturing the same |
| abstract | The present invention relates to a radiation-sensitive resin composition, a spacer and protective film of liquid crystal element, and method for manufacturing them. The purpose of the present invention is to provide a radiation-sensitive resin composition, which has high radiation sensibility; also can be used to manufacture a pattern-like film having desired pattern size and excellent intensity even in the lower exposure amount; besides, can be developed on short time. The said radiation-sensitive resin composition comprises (A) alkali solubility resin, (B) polymerization unsaturated compound, and (C) radiation-sensitive polymeric initiator, in which the said (B) polymerization unsaturated compound is at least one (meth)acrylate compound selected from the group consisting of the compound represented by the following formula (1). In the formula (1), X each indenpendently represents anyone of hydrogen atom, acryloyl group, methacryloyl group, and at least one thereof is acryloyl group or methacryloyl group; furthermore, a to f are integers, and sum total of a to f are 6 to 24. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10663861-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10042254-B2 |
| priorityDate | 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 249.