| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-003 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 |
| filingDate |
2009-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a1a62fffe6926a274f503bda1f17ec4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28ef31e4c9638961ead85de93bc26338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcc4e2c9be500b1108ab0cc2e7852d0c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_566ef457a16bfd66a42f4cf646a39ad2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5290a5ee9192dd176b903094e94c06a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64dfd211fefbcb9a56bab9744057cfa2 |
| publicationDate |
2010-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201026878-A |
| titleOfInvention |
Precursors for depositing group 4 metal-containing films |
| abstract |
Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M comprises a metal chosen from Ti, Zr, and Hf; R and R1 are each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; R2 is an alkyl group comprising from 1 to 10 carbon atoms; R3 is chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms; R4 is an alkyl group comprising from 1 to 6 carbon atoms and wherein R2 and R4 are different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors. |
| priorityDate |
2008-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |